Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films

Vincenzo Esposito; D. W.  Ni; Fabrizio Gualandris; Nini Pryds

doi:10.1039/C7RA01226H

Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films

Vincenzo Esposito, D. W. Ni, Fabrizio Gualandris, Nini Pryds

Department of Energy Conversion and Storage

Chinese Academy of Sciences

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Abstract

Acceptor-doped nanocrystalline cerium oxide thin films are mechanically constrained nano-domains, with film/substrate interfacial strain and chemical doping deadlock mass diffusion. In contrast, in this paper we show that chemical elements result in highly unstable thin films under chemical reduction, with unexpected diffusion-driven effects such as fast migration of grain boundaries, porosity nucleation, and interdiffusion at low temperatures.

Original language	English
Journal	R S C Advances
Volume	7
Issue number	23
Pages (from-to)	13784-13788
ISSN	2046-2069
DOIs	https://doi.org/10.1039/C7RA01226H
Publication status	Published - 2017

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This article is Open Access and licensed under a Creative Commons Attribution 3.0 Unported Licence.

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10.1039/C7RA01226H

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AB - Acceptor-doped nanocrystalline cerium oxide thin films are mechanically constrained nano-domains, with film/substrate interfacial strain and chemical doping deadlock mass diffusion. In contrast, in this paper we show that chemical elements result in highly unstable thin films under chemical reduction, with unexpected diffusion-driven effects such as fast migration of grain boundaries, porosity nucleation, and interdiffusion at low temperatures.

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Releasing cation diffusion in self-limited nanocrystalline defective ceria thin films

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