Refractive Index Sensing by High Aspect Ratio  Titanium Nitride Trench Structures

Evgeniy Shkondin; Taavi Repän; Osamu Takayama

doi:10.1364/NOMA.2018.NoTh3D.3

Refractive Index Sensing by High Aspect Ratio Titanium Nitride Trench Structures

Evgeniy Shkondin, Taavi Repän, Osamu Takayama

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

Titanium nitride grating structures are fabricated by a combination of deep reactive ion etching and atomic layer deposition. Such structures being analyzed as an ambient medium sensor, exhibit the refractive index sensitivity of 430 nm/RIU.

Original language	English
Title of host publication	Novel Optical Materials and Applications 2018
Number of pages	2
Publisher	Optical Society of America (OSA)
Publication date	2018
Article number	NoTh3D.3
ISBN (Print)	978-1-943580-43-9
DOIs	https://doi.org/10.1364/NOMA.2018.NoTh3D.3
Publication status	Published - 2018
Event	Novel Optical Materials and Applications 2018 - ETH, Zurich , Switzerland Duration: 2 Jul 2018 → 5 Jul 2018

Conference

Conference	Novel Optical Materials and Applications 2018
Location	ETH
Country/Territory	Switzerland
City	Zurich
Period	02/07/2018 → 05/07/2018

Bibliographical note

From the session: Tunable Metadevices II (NoTh3D)

Access to Document

10.1364/NOMA.2018.NoTh3D.3

NOMA 2018 NoTh3DAccepted author manuscript, 249 KB

OpenUrl availability

Full text

DarkSILD: Dark-field hyperlens: Superresolution imaging and label-free sensing device for biological applications
Laurynenka, A. (Project Manager), Novitsky, A. (Project Participant), Takayama, O. (Project Participant), Shkondin, E. (Project Participant) & Repän, T. (PhD Student)
01/06/2016 → 06/09/2019
Project: Research

Cite this

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title = "Refractive Index Sensing by High Aspect Ratio Titanium Nitride Trench Structures",

abstract = "Titanium nitride grating structures are fabricated by a combination of deep reactive ion etching and atomic layer deposition. Such structures being analyzed as an ambient medium sensor, exhibit the refractive index sensitivity of 430 nm/RIU.",

author = "Evgeniy Shkondin and Taavi Rep{\"a}n and Osamu Takayama",

note = "From the session: Tunable Metadevices II (NoTh3D); Novel Optical Materials and Applications 2018 ; Conference date: 02-07-2018 Through 05-07-2018",

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AB - Titanium nitride grating structures are fabricated by a combination of deep reactive ion etching and atomic layer deposition. Such structures being analyzed as an ambient medium sensor, exhibit the refractive index sensitivity of 430 nm/RIU.

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DO - 10.1364/NOMA.2018.NoTh3D.3

M3 - Article in proceedings

SN - 978-1-943580-43-9

BT - Novel Optical Materials and Applications 2018

PB - Optical Society of America (OSA)

T2 - Novel Optical Materials and Applications 2018

Y2 - 2 July 2018 through 5 July 2018

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