Rapid, Brushless Self-assembly of a PS-b-PDMS Block Copolymer for Nanolithography

Sozaraj Rasappa, Lars Schulte, Dipu Borah, Michael A. Morris, Sokol Ndoni

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Block copolymers (BCP) are highly promising self-assembling precursors for scalable nanolithography. Very regular BCP nanopatterns can be used as on-chip etch masks. The first step in the processing of BCP thin films is usually the chemical modification of the substrate surface, typically by grafting of a brush layer that renders the surface energy neutral relative to the constituent blocks. We provide here a first study on rapid, low temperature self-assembly of PS-b-PDMS (polystyrene-block-polydimethylsiloxane) on silicon substrates without a brush layer. We show that it forms line and antidot patterns after short solvo-thermal annealing. Unlike previous reports on this system, low temperature and short annealing time provide self-assembly in homogeneous thin films covering large substrate areas. This on-chip mask was then used for pattern transfer to the underlying silicon substrate. SEM (scanning electron microscope) images reveal silicon nanowires relative to the PDMS patterns of the BCP mask.
Original languageEnglish
JournalColloids and Interface Science Communications
Pages (from-to)1-5
Number of pages5
Publication statusPublished - 2014


  • Self-assembly
  • PS-b-PDMS
  • Silicon nanostructures
  • Solvo-thermal annealing
  • Brushless
  • Soft mask template
  • Dry etching
  • Pattern transfer
  • Lines and antidots
  • Aspect ratio


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