Quasi-Random Gratings Enabled by Wrinkled Photoresist Surfaces on a Rigid Substrate

Bingdong Chang*, Ding Zhao, Hongyu Sun

*Corresponding author for this work

Research output: Contribution to journalJournal articlepeer-review

Abstract

Micro- A nd nanoscale surface wrinkling has been widely studied in artificial systems, mostly in soft substrates like polydimethylsiloxane or polystyrene, where the wrinkling dynamics are triggered by thermal stresses or tensile prestrains. Here, we introduce a new wrinkling regime based on photoresist layers on top of a rigid substrate. By introducing a bending deformation, combined with fluorine-based plasma treatment, wrinkles with a characteristic wavelength less than 1 μm can be created. By adding micropatterns on photoresists with standard UV exposure, ordered wrinkles can also be realized. This technique is demonstrated to be applicable in several commercially available photoresists, and the wrinkled patterns can be employed conveniently to create high-aspect-ratio silicon gratings and large-area silicon dioxide membranes. This unique strategy broadens the spectrum of available materials to create wrinkled surfaces in a controllable manner and provides a platform for the easier fabrication of wrinkle-based devices.

Original languageEnglish
JournalACS Applied Materials and Interfaces
Volume13
Pages (from-to)49535−49541
ISSN1944-8244
DOIs
Publication statusPublished - 2021

Bibliographical note

Funding Information:
The author would like to thank the DTU Nanolab for the instrument support. This work was supported by a research grant (00027987) from VILLUM FONDEN.

Keywords

  • Photoresist
  • Random gratings
  • Reactive ion etching
  • Thin film
  • Wrinkles

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