Quantitative TEM analysis of Al/Cu multilayer systems prepared by pulsed laser deposition

Haihua Liu, Nini Pryds, Jørgen Schou, Xiaoxu Huang

Research output: Contribution to journalJournal articleResearchpeer-review


Thin films composed of alternating Al/Cu/Al layers were deposited on a (111) Si substrate using pulsed laser deposition (PLD). The thicknesses of the film and the individual layers, and the detailed internal structure within the layers were characterized by means of transmission electron microscopy (TEM), high-resolution TEM (HRTEM), and energy-filtered TEM (EFTEM). Each Al or Cu layer consists of a single layer of nano-sized grains of different orientations. EFTEM results revealed a layer of oxide about 2 nm thick on the surface of the Si substrate, which is considered to be the reason for the formation of the first layer of nano-sized Al grains. The results demonstrate that the PLD technique is a powerful tool to produce nano-scale multilayered metal films with controllable thickness and grain sizes.
Original languageEnglish
JournalApplied Physics A: Materials Science & Processing
Issue number4
Pages (from-to)677-680
Publication statusPublished - 2010


  • Materials characterization and modelling
  • Materials and energy storage

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