TY - JOUR
T1 - Quantitative TEM analysis of Al/Cu multilayer systems prepared by pulsed laser deposition
AU - Liu, Haihua
AU - Pryds, Nini
AU - Schou, Jørgen
AU - Huang, Xiaoxu
PY - 2010
Y1 - 2010
N2 - Thin films composed of alternating Al/Cu/Al layers were deposited on a (111) Si substrate using pulsed laser deposition (PLD). The thicknesses of the film and the individual layers, and the detailed internal structure within the layers were characterized by means of transmission electron microscopy (TEM), high-resolution TEM (HRTEM), and energy-filtered TEM (EFTEM). Each Al or Cu layer consists of a single layer of nano-sized grains of different orientations. EFTEM results revealed a layer of oxide about 2 nm thick on the surface of the Si substrate, which is considered to be the reason for the formation of the first layer of nano-sized Al grains. The results demonstrate that the PLD technique is a powerful tool to produce nano-scale multilayered metal films with controllable thickness and grain sizes.
AB - Thin films composed of alternating Al/Cu/Al layers were deposited on a (111) Si substrate using pulsed laser deposition (PLD). The thicknesses of the film and the individual layers, and the detailed internal structure within the layers were characterized by means of transmission electron microscopy (TEM), high-resolution TEM (HRTEM), and energy-filtered TEM (EFTEM). Each Al or Cu layer consists of a single layer of nano-sized grains of different orientations. EFTEM results revealed a layer of oxide about 2 nm thick on the surface of the Si substrate, which is considered to be the reason for the formation of the first layer of nano-sized Al grains. The results demonstrate that the PLD technique is a powerful tool to produce nano-scale multilayered metal films with controllable thickness and grain sizes.
KW - Materials characterization and modelling
KW - Materials and energy storage
KW - Materialekarakterisering og materialemodellering
KW - Materialer og energilagring
U2 - 10.1007/s00339-010-5923-6
DO - 10.1007/s00339-010-5923-6
M3 - Journal article
SN - 0947-8396
VL - 101
SP - 677
EP - 680
JO - Applied Physics A: Materials Science & Processing
JF - Applied Physics A: Materials Science & Processing
IS - 4
ER -