Quality Control of JEOL JBX-9500 E-beam Lithography System in a Multi-User Laboratory

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    323 Downloads (Pure)
    Original languageEnglish
    Publication date2015
    Number of pages1
    Publication statusPublished - 2015
    Event41st International conference on Micro and Nano Engineering : MNE 2015 - The Hague, Netherlands
    Duration: 21 Sep 201524 Sep 2015
    Conference number: 41

    Conference

    Conference41st International conference on Micro and Nano Engineering
    Number41
    CountryNetherlands
    CityThe Hague
    Period21/09/201524/09/2015

    Cite this

    Greibe, T., Anhøj, T. A., Han, A., & Johansen, L. (2015). Quality Control of JEOL JBX-9500 E-beam Lithography System in a Multi-User Laboratory. Abstract from 41st International conference on Micro and Nano Engineering , The Hague, Netherlands.