Quality Control of JEOL JBX-9500 E-beam Lithography System in a Multi-User Laboratory

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Original language	English
Publication date	2015
Number of pages	1
Publication status	Published - 2015
Event	41st International conference on Micro and Nano Engineering : MNE 2015 - The Hague, Netherlands Duration: 21 Sep 2015 → 24 Sep 2015 Conference number: 41

Conference	41st International conference on Micro and Nano Engineering
Number	41
Country/Territory	Netherlands
City	The Hague
Period	21/09/2015 → 24/09/2015

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@conference{352c6f93c7fc458e938080d8968c46a2,

title = "Quality Control of JEOL JBX-9500 E-beam Lithography System in a Multi-User Laboratory",

author = "Tine Greibe and Anh{\o}j, {Thomas Aar{\o}e} and Anpan Han and Leif Johansen",

year = "2015",

language = "English",

note = "41st International conference on Micro and Nano Engineering : MNE 2015, MNE 2015 ; Conference date: 21-09-2015 Through 24-09-2015",

}

TY - ABST

T1 - Quality Control of JEOL JBX-9500 E-beam Lithography System in a Multi-User Laboratory

AU - Greibe, Tine

AU - Anhøj, Thomas Aarøe

AU - Han, Anpan

AU - Johansen, Leif

N1 - Conference code: 41

PY - 2015

Y1 - 2015

M3 - Conference abstract for conference

T2 - 41st International conference on Micro and Nano Engineering

Y2 - 21 September 2015 through 24 September 2015

ER -