Pulsed exposure in Mask Projection Vat Photopolymerization

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

Abstract

This work investigates the impact of a pulsated exposure, in comparison with the conventional continuous exposure, on one-layer samples manufactured using Mask Projection Vat Photopolymerization (MP VPP). The samples were characterized in surface appearance and geometrical measurements, indicating their curing levels, using Light Optical Microscopy (LOM). Results showed that pulsed exposure has a clear impact on the overall samples' appearance and curing level, with the shortest pulse showing the most promising outcomes. This means that pulsated exposure could improve the overall quality of MP VPP parts.

Original languageEnglish
Title of host publicationEuropean Society for Precision Engineering and Nanotechnology, Conference Proceedings : 23rd International Conference and Exhibition, EUSPEN 2023
EditorsO. Riemer, C. Nisbet, D. Phillips
Publishereuspen
Publication date2023
Pages177-178
ISBN (Electronic)978-199899913-2
Publication statusPublished - 2023
Event23rd International Conference of the European Society for Precision Engineering and Nanotechnology - Copenhagen, Denmark, Copenhagen, Denmark
Duration: 12 Jun 202316 Jun 2023

Conference

Conference23rd International Conference of the European Society for Precision Engineering and Nanotechnology
LocationCopenhagen, Denmark
Country/TerritoryDenmark
CityCopenhagen
Period12/06/202316/06/2023

Keywords

  • DMD
  • pulsed exposure
  • Vat Photopolymerization

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