Proximity Effects in a Chemically Amplified Electron Beam Resist Patterned at 100 keV

William Tiddi, Tine Greibe, Marco Beleggia, Anpan Han

    Research output: Contribution to conferenceConference abstract for conferenceResearchpeer-review

    272 Downloads (Pure)
    Original languageEnglish
    Publication date2015
    Number of pages1
    Publication statusPublished - 2015
    Event41st International conference on Micro and Nano Engineering : MNE 2015 - The Hague, Netherlands
    Duration: 21 Sept 201524 Sept 2015
    Conference number: 41

    Conference

    Conference41st International conference on Micro and Nano Engineering
    Number41
    Country/TerritoryNetherlands
    CityThe Hague
    Period21/09/201524/09/2015

    Keywords

    • Electron beam lithography
    • Chemically amplified resist
    • Negative resist
    • Promixity effects

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