Abstract
In general mask based laser material processing (MBLMP) is a
process which suffers from a low energy efficiency, because the
majority of the laser light is absorbed in or reflected by the
mask. We have developed a device called an energy enhancer which
is capable of improving the energy efficiency by a factor of 2 - 4
for a typical TEA-CO2 system for mask based laser marking. A
simple ray-tracing model has been built in order to design and
optimise the energy enhancer. Thus we present experimental results
as well as simulations and show fine accordance between the two.
Important system parameters like component reflectivity and
alignment sensitivity are investigated in order to evaluate the
possibility of making commercial use of the device. The obtainable
image quality and how this is influenced by the focusing and
imaging system is discussed in some detail.
| Original language | English |
|---|---|
| Title of host publication | Proceedings Europto |
| Place of Publication | Munich |
| Publication date | 1997 |
| Pages | 400-411 |
| Publication status | Published - 1997 |
| Event | EUROPTO, European Symposium on Lasers and Optics in
Manufacturing III - Munich Duration: 1 Jan 1997 → … |
Conference
| Conference | EUROPTO, European Symposium on Lasers and Optics in Manufacturing III |
|---|---|
| City | Munich |
| Period | 01/01/1997 → … |