Process variations in surface nano geometries manufacture on large area substrates

Matteo Calaon, Hans Nørgaard Hansen, Guido Tosello, Jørgen Garnæs, Jesper Nørregaard, W. Li

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Abstract

The need of transporting, treating and measuring increasingly smaller biomedical samples has pushed the integration of a far reaching number of nanofeatures over large substrates size in respect to the conventional processes working area windows. Dimensional stability of nano fabrication processes over large area is key to ensure the device functionality. In this research, the process variation of sub-μm lithography processes is evaluated for different positions and features orientations, identified by produced test structures on a 100 mm diameter, 525 μm thick silicon wafer. The deviations from the target designed dimensions are quantified through AFM measurements on the silicon and on the subsequentely electroplated nickel geometries.
Original languageEnglish
Title of host publicationProceedings of the 14th euspen International Conference
Number of pages4
Publishereuspen
Publication date2014
Publication statusPublished - 2014
Event14th International Conference of the European Society for Precision Engineering and Nanotechnology - Valamar Lacroma Hotel, Dubrovnik, Croatia
Duration: 2 Jun 20146 Jun 2014
Conference number: 14

Conference

Conference14th International Conference of the European Society for Precision Engineering and Nanotechnology
Number14
LocationValamar Lacroma Hotel
CountryCroatia
CityDubrovnik
Period02/06/201406/06/2014

Cite this

Calaon, M., Hansen, H. N., Tosello, G., Garnæs, J., Nørregaard, J., & Li, W. (2014). Process variations in surface nano geometries manufacture on large area substrates. In Proceedings of the 14th euspen International Conference euspen.