Abstract
The need
of transporting, treating and measuring increasingly smaller biomedical samples
has pushed the integration of a far reaching number of nanofeatures over large
substrates size in respect to the conventional processes working area windows.
Dimensional stability of nano fabrication processes over large area is key to
ensure the device functionality. In this research, the process variation of
sub-μm lithography
processes is evaluated for different positions and features orientations,
identified by produced test structures on a 100 mm diameter, 525 μm thick silicon wafer. The
deviations from the target designed dimensions are quantified through AFM
measurements on the silicon and on the subsequentely electroplated nickel
geometries.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the 14th euspen International Conference |
| Number of pages | 4 |
| Publisher | euspen |
| Publication date | 2014 |
| Publication status | Published - 2014 |
| Event | 14th International Conference of the European Society for Precision Engineering and Nanotechnology - Valamar Lacroma Hotel, Dubrovnik, Croatia Duration: 2 Jun 2014 → 6 Jun 2014 Conference number: 14 |
Conference
| Conference | 14th International Conference of the European Society for Precision Engineering and Nanotechnology |
|---|---|
| Number | 14 |
| Location | Valamar Lacroma Hotel |
| Country/Territory | Croatia |
| City | Dubrovnik |
| Period | 02/06/2014 → 06/06/2014 |