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Potential analytical applications of negative ions from a pulsed radiofrequency glow discharge in argon

  • Stela Canulescu
  • , James Whitby
  • , Katrin Fuhrer
  • , Markus Hold
  • , Marc Gonin
  • , Thomas Horvath
  • , Johann Michler
  • Tofwerk AG
  • Swiss Federal Laboratories for Materials Science and Technology (Empa)

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

Detection of negative ions from a conventional analytical glow discharge source using argon as the working gas is reported. The negative ions are recorded using a pulsed discharge source coupled with a time-of-flight mass spectrometer. A considerable enhancement in the "afterglow" region of the negative ion signal for halogens and halogenated molecules and reduction in background is observed. This is the first time when negative ions have been reported for halogen containing materials and we illustrate our findings with results from the polytetrafluoroethene polymer (PTFE).
Original languageEnglish
JournalJournal of Analytical Atomic Spectrometry
Volume24
Issue number2
Pages (from-to)178-180
ISSN0267-9477
DOIs
Publication statusPublished - 2009
Externally publishedYes

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