Abstract
Using cross-hatched, patterned semiconductor surfaces and round
20-nm-thick gold pads on semiconductor wafers, we investigate the
imaging characteristics of a reflection near-field optical
microscope with an uncoated fibre tip for different polarization
configurations and light wavelengths. Is is shown that
cross-polarized detection allows one to effectively suppress
far-field components in the detected signal and to realise imaging
of optical contrast on the sub-wavelength scale. The sensitivity
window of our microscope, i.e. the scale on which near-field
optical images represent mainly optical contrast is found to be ~
100 nm for light wavelengths in the visible region. We demonstrate
imaging of near-field components of a dipole field and purely
dielectric contrast (related to well-width fluctuations in a
semiconductor quantum well) with a spatial resolution of ~ 100 nm.
The results obtained show that such a near-field technique can be
used for polarization-sensitive imaging with reasonably high
spatial resolution and suggest a number of applications for this
technique.
Original language | English |
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Journal | Journal of Microscopy |
Volume | 194 |
Issue number | 2-3 |
Pages (from-to) | 500-506 |
Publication status | Published - 1999 |