Plasma texturing on large-area industrial grade CZ silicon solar cells

Rasmus Schmidt Davidsen, Ørnulf Nordseth, Anja Boisen, Michael Stenbæk Schmidt, Ole Hansen

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

Abstract

We report on an experimental study of nanostructuring of silicon solar cells using reactive ion etching (RIE). A simple mask-less, scalable RIE nanostructuring of the solar cell surface is shown to reduce the AM1.5-weighted average reflectance to a level below 1 % in a fully optimized RIE texturing, and thus holds a significant potential for improvement of the cell performance compared to current industrial standards. The reflectance is shown to remain below that of conventional textured cells also at high angle of incidence. The process is shown to be equally applicable to mono-, multi- and quasi-mono-crystalline Si. The process was successfully integrated in fabrication of solar cells using only industry standard processes on a Czochralski (CZ) silicon starting material. The resulting cell performance was compared to cells with conventional texturing. For cells, where the nanostructuring was not fully optimized (reflectance larger than 2 %), an efficiency of 16.5 % at 1 sun was demonstrated.
Original languageEnglish
Title of host publicationProceedings for EU PVSEC 2013
Number of pages3
Publication date2013
Publication statusPublished - 2013
Event28th European PV Solar Energy Conference and Exhibition (EU PVSEC 2013) - Paris, France
Duration: 30 Sep 20134 Oct 2013
http://www.photovoltaic-conference.com/

Conference

Conference28th European PV Solar Energy Conference and Exhibition (EU PVSEC 2013)
CountryFrance
CityParis
Period30/09/201304/10/2013
Internet address

Keywords

  • Anti-reflective coating
  • C-Si
  • Czochralski
  • Multicrystalline
  • Silicon
  • Solar cell efficiency
  • Texturisation

Fingerprint Dive into the research topics of 'Plasma texturing on large-area industrial grade CZ silicon solar cells'. Together they form a unique fingerprint.

Cite this