In this paper the influence of RF power, ammonia flow, annealing temperature, and annealing time on the optical and mechanical properties of plasma-enhanced chemically vapor deposited silicon oxynitride films, is presented. A low refractive index (1.47 to 1.48) film having tensile stress has been developed as cladding material for optical waveguides. By combining this waveguide material with a special type of UV photosensitive glass, a low tensile stress strip-loaded waveguide structure, based on a three-layer sandwich structure, has been designed and the stress distribution through the structure investigated.
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Storgaard-Larsen, T., & Leistiko, O. (1997). Plasma-enhanced chemical vapor deposited silicon oxynitride films for optical waveguide bridges for use in mechanical sensors. Journal of The Electrochemical Society, 144(4), 1505-1513. https://doi.org/10.1149/1.1837619