Plasma diagnostics during magnetron sputtering of aluminum doped zinc oxide

Eugen Stamate, Andrea Crovetto, Simone Sanna

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Abstract

Plasma parameters during magnetron sputtering of aluminum-doped zinc oxide are investigated with optical emission spectroscopy, electrostatic probes and mass spectrometry with the aim of
understanding the role of negative ions of oxygen during the film growth and improving the uniformity of the film resistivity over the deposition area.
Original languageEnglish
Title of host publicationProceedings of 23rd Europhysics Conference on Atomic and Molecular Physics of Ionized Gases (ESCAMPIG XXIII)
PublisherEuropean Physical Society
Publication date2016
Pages327-328
Publication statusPublished - 2016
Event 23rd Europhysics Conference on Atomic and Molecular Physics of Ionized Gases - Bratislava, Slovakia
Duration: 12 Jul 201616 Jul 2016
https://www.escampig2016.org/

Conference

Conference 23rd Europhysics Conference on Atomic and Molecular Physics of Ionized Gases
CountrySlovakia
CityBratislava
Period12/07/201616/07/2016
Internet address

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