Plasma diagnostics by detecting the ion flux profile to a biased-target

Eugen Stamate; K. Ohe; O. Takai; H. Sugai

doi:10.1016/S0257-8972(03)00151-8

Plasma diagnostics by detecting the ion flux profile to a biased-target

Eugen Stamate, K. Ohe, O. Takai, H. Sugai

Research output: Contribution to journal › Journal article › Research › peer-review

Abstract

A new method for reactive plasma diagnostics is established. It is based on the electrostatic lens effect of the sheath evolving to a one-side biased-target that focuses charged particles to distinct regions of the surface. Thus, developing the ion sputtering profile one can obtain information about sheath thickness, negative ion density, and dust content. The applicability of the method is tested in electropositive and electronegative plasmas of Ar, O2 and Ar/SF6 gases.

Original language	English
Journal	Surface and Coatings Technology
Volume	169-170
Pages (from-to)	65-68
ISSN	0257-8972
DOIs	https://doi.org/10.1016/S0257-8972(03)00151-8
Publication status	Published - 2003
Externally published	Yes

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title = "Plasma diagnostics by detecting the ion flux profile to a biased-target",

abstract = "A new method for reactive plasma diagnostics is established. It is based on the electrostatic lens effect of the sheath evolving to a one-side biased-target that focuses charged particles to distinct regions of the surface. Thus, developing the ion sputtering profile one can obtain information about sheath thickness, negative ion density, and dust content. The applicability of the method is tested in electropositive and electronegative plasmas of Ar, O2 and Ar/SF6 gases.",

author = "Eugen Stamate and K. Ohe and O. Takai and H. Sugai",

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T1 - Plasma diagnostics by detecting the ion flux profile to a biased-target

AU - Stamate, Eugen

AU - Ohe, K.

AU - Takai, O.

AU - Sugai, H.

PY - 2003

Y1 - 2003

N2 - A new method for reactive plasma diagnostics is established. It is based on the electrostatic lens effect of the sheath evolving to a one-side biased-target that focuses charged particles to distinct regions of the surface. Thus, developing the ion sputtering profile one can obtain information about sheath thickness, negative ion density, and dust content. The applicability of the method is tested in electropositive and electronegative plasmas of Ar, O2 and Ar/SF6 gases.

AB - A new method for reactive plasma diagnostics is established. It is based on the electrostatic lens effect of the sheath evolving to a one-side biased-target that focuses charged particles to distinct regions of the surface. Thus, developing the ion sputtering profile one can obtain information about sheath thickness, negative ion density, and dust content. The applicability of the method is tested in electropositive and electronegative plasmas of Ar, O2 and Ar/SF6 gases.

U2 - 10.1016/S0257-8972(03)00151-8

DO - 10.1016/S0257-8972(03)00151-8

M3 - Journal article

SN - 0257-8972

VL - 169-170

SP - 65

EP - 68

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

Plasma diagnostics by detecting the ion flux profile to a biased-target

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