Plasma diagnostics by detecting the ion flux profile to a biased-target

Eugen Stamate, K. Ohe, O. Takai, H. Sugai

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

A new method for reactive plasma diagnostics is established. It is based on the electrostatic lens effect of the sheath evolving to a one-side biased-target that focuses charged particles to distinct regions of the surface. Thus, developing the ion sputtering profile one can obtain information about sheath thickness, negative ion density, and dust content. The applicability of the method is tested in electropositive and electronegative plasmas of Ar, O2 and Ar/SF6 gases.
Original languageEnglish
JournalSurface and Coatings Technology
Volume169-170
Pages (from-to)65-68
ISSN0257-8972
DOIs
Publication statusPublished - 2003
Externally publishedYes

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