Photothermal modification of plasmonic structures

Xiaolong Zhu (Inventor), Anders Kristensen (Inventor), Emil Højlund-Nielsen (Inventor), Christoph Vannahme (Inventor), N. Asger Mortensen (Inventor)

Research output: Patent

281 Downloads (Pure)

Abstract

There is presented a method for geometrically modifying plasmonic structures on a support structure, such as for printing or recording, said method comprising changing a geometry specifically of plasmonic structures, wherein said changing the geometry is carried out by photothermally melting at least a portion of each of the plasmonic structures within the second plurality of plasmonic structures by irradiating, the plasmonic structures with incident electromagnetic radiation having an incident intensity in a plane of the second plurality of plasmonic structures, wherein said incident intensity is less than an incident intensity required to melt a film of a corresponding material and a corresponding thickness as the plasmonic structures within the second plurality of plasmonic structures.

Original languageEnglish
IPCG02B 5/ 26 A N
Patent numberWO2016198657
Filing date15/12/2016
CountryInternational Bureau of the World Intellectual Property Organization (WIPO)
Priority date12/06/2015
Priority numberEP20150171905
Publication statusPublished - 15 Dec 2016

Cite this

Zhu, X., Kristensen, A., Højlund-Nielsen, E., Vannahme, C., & Mortensen, N. A. (2016). IPC No. G02B 5/ 26 A N. Photothermal modification of plasmonic structures. (Patent No. WO2016198657).