Abstract
There is presented a method for geometrically modifying plasmonic structures on a support structure, such as for printing or recording, said method comprising changing a geometry specifically of plasmonic structures, wherein said changing the geometry is carried out by photothermally melting at least a portion of each of the plasmonic structures within the second plurality of plasmonic structures by irradiating, the plasmonic structures with incident electromagnetic radiation having an incident intensity in a plane of the second plurality of plasmonic structures, wherein said incident intensity is less than an incident intensity required to melt a film of a corresponding material and a corresponding thickness as the plasmonic structures within the second plurality of plasmonic structures.
| Original language | English |
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| IPC | G02B 5/ 26 A N |
| Patent number | WO2016198657 |
| Filing date | 15/12/2016 |
| Country/Territory | International Bureau of the World Intellectual Property Organization (WIPO) |
| Priority date | 12/06/2015 |
| Priority number | EP20150171905 |
| Publication status | Published - 15 Dec 2016 |