Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325 nm and its spatial resolution limit

D. Sáez-Rodríguez, Kristian Nielsen, Ole Bang, D.J. Webb

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

In this Letter, we provide evidence suggesting that the main photosensitive mechanism of an undoped poly(methyl methacrylate)-based microstructured optical fiber under UV radiation at 325 nm is a competitive process of both photodegradation and polymerization. We found experimentally that increasing strain during photo-inscription leads to an increased photosensitivity, which is evidence of photodegradation. Likewise, refractive index change in the fiber was measured to be positive, which provides evidence for further polymerization of the material. Finally, we relate the data obtained to the spatial recording resolution of the samples. © 2014 Optical Society of America.
Original languageEnglish
JournalOptics Letters
Volume39
Issue number12
Pages (from-to)3421-3424
Number of pages4
ISSN0146-9592
DOIs
Publication statusPublished - 2014

Keywords

  • Esters
  • Light sensitive materials
  • Optical fibers
  • Photosensitivity
  • Polymerization
  • Ultraviolet radiation
  • Micro-structured optical fibers
  • Recording resolution
  • Refractive index changes
  • Spatial resolution
  • Acrylic monomers

Fingerprint

Dive into the research topics of 'Photosensitivity mechanism of undoped poly(methyl methacrylate) under UV radiation at 325 nm and its spatial resolution limit'. Together they form a unique fingerprint.

Cite this