Photonic wires sidewall roughness measures using AFM capabilities

Radu Malureanu, Lars Hagedorn Frandsen

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

Abstract

Within the last years, interest in photonic wires and photonic crystals grew due to their demonstrated ability of controlling light propagation and characteristics. One of the limitations of such devices is due to the induced roughness during the fabrication process. Generally, an increase in roughness leads to loss increase thus limiting the propagation length and postponing the commercialization of such structures. In this paper we present a new algorithm for measuring the sidewall roughness of our devices based on atomic force microscope (AFM) approach. Using this algorithm, the roughness can be quantified and thus actions in decreasing it can be taken improving the device's performance.
Original languageEnglish
Title of host publicationSPIE Digital Library
Volume6995, No. 1
Place of PublicationStrasbourg, France
Publication date2008
ISBN (Print)978-0-8194-7193-2
Publication statusPublished - 2008
EventPhotonics Europe 2008 - Palais de la Musique et des Congrès, Strasbourg, France
Duration: 7 Apr 200811 Apr 2008
http://spie.org/x24034.xml

Conference

ConferencePhotonics Europe 2008
LocationPalais de la Musique et des Congrès
CountryFrance
CityStrasbourg
Period07/04/200811/04/2008
Internet address

Keywords

  • AFM measures
  • sidewall roughness
  • photonic wires

Cite this

Malureanu, R., & Frandsen, L. H. (2008). Photonic wires sidewall roughness measures using AFM capabilities. In SPIE Digital Library (Vol. 6995, No. 1).