Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

Lei Wei; Elena Khomtchenko; Thomas Tanggaard Alkeskjold; Anders Overgaard Bjarklev

Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

Lei Wei
, Elena Khomtchenko
, Thomas Tanggaard Alkeskjold
, Anders Overgaard Bjarklev

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.

Original language	English
Title of host publication	Proceedings, OFC
Publisher	IEEE
Publication date	2009
Pages	1-3
ISBN (Print)	978-1-4244-2606-5
Publication status	Published - 2009
Event	2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC - San Diego, CA, United States Duration: 22 Mar 2009 → 26 Mar 2009

Conference

Conference	2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC
Country/Territory	United States
City	San Diego, CA
Period	22/03/2009 → 26/03/2009

Bibliographical note

Copyright: 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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@inproceedings{f59b6497159144eca32761edc3af911e,

title = "Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices",

abstract = "Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.",

author = "Lei Wei and Elena Khomtchenko and Alkeskjold, \{Thomas Tanggaard\} and Bjarklev, \{Anders Overgaard\}",

note = "Copyright: 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE; 2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC, OFC/NFOEC'09 ; Conference date: 22-03-2009 Through 26-03-2009",

year = "2009",

language = "English",

isbn = "978-1-4244-2606-5",

pages = "1--3",

booktitle = "Proceedings, OFC",

publisher = "IEEE",

address = "United States",

}

Wei, L, Khomtchenko, E, Alkeskjold, TT & Bjarklev, AO 2009, Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices. in Proceedings, OFC. IEEE, pp. 1-3, 2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC, San Diego, CA, United States, 22/03/2009.

Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices. / Wei, Lei; Khomtchenko, Elena; Alkeskjold, Thomas Tanggaard et al.
Proceedings, OFC. IEEE, 2009. p. 1-3.

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

TY - GEN

T1 - Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

AU - Wei, Lei

AU - Khomtchenko, Elena

AU - Alkeskjold, Thomas Tanggaard

AU - Bjarklev, Anders Overgaard

N1 - Copyright: 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

PY - 2009

Y1 - 2009

N2 - Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.

AB - Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.

M3 - Article in proceedings

SN - 978-1-4244-2606-5

SP - 1

EP - 3

BT - Proceedings, OFC

PB - IEEE

T2 - 2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC

Y2 - 22 March 2009 through 26 March 2009

ER -

Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

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