Abstract
Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.
Original language | English |
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Title of host publication | Proceedings, OFC |
Publisher | IEEE |
Publication date | 2009 |
Pages | 1-3 |
ISBN (Print) | 978-1-4244-2606-5 |
Publication status | Published - 2009 |
Event | 2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC - San Diego, CA, United States Duration: 22 Mar 2009 → 26 Mar 2009 |
Conference
Conference | 2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC |
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Country/Territory | United States |
City | San Diego, CA |
Period | 22/03/2009 → 26/03/2009 |