Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

Lei Wei, Elena Khomtchenko, Thomas Tanggaard Alkeskjold, Anders Overgaard Bjarklev

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    Abstract

    Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.
    Original languageEnglish
    Title of host publicationProceedings, OFC
    PublisherIEEE
    Publication date2009
    Pages1-3
    ISBN (Print)978-1-4244-2606-5
    Publication statusPublished - 2009
    Event2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC - San Diego, CA, United States
    Duration: 22 Mar 200926 Mar 2009

    Conference

    Conference2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC
    Country/TerritoryUnited States
    CitySan Diego, CA
    Period22/03/200926/03/2009

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