Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

Lei Wei, Elena Khomtchenko, Thomas Tanggaard Alkeskjold, Anders Overgaard Bjarklev

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Abstract

Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.
Original languageEnglish
Title of host publicationProceedings, OFC
PublisherIEEE
Publication date2009
Pages1-3
ISBN (Print)978-1-4244-2606-5
Publication statusPublished - 2009
Event2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC - San Diego, CA, United States
Duration: 22 Mar 200926 Mar 2009

Conference

Conference2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC
CountryUnited States
CitySan Diego, CA
Period22/03/200926/03/2009

Bibliographical note

Copyright: 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

Cite this

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title = "Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices",
abstract = "Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.",
author = "Lei Wei and Elena Khomtchenko and Alkeskjold, {Thomas Tanggaard} and Bjarklev, {Anders Overgaard}",
note = "Copyright: 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE",
year = "2009",
language = "English",
isbn = "978-1-4244-2606-5",
pages = "1--3",
booktitle = "Proceedings, OFC",
publisher = "IEEE",
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Wei, L, Khomtchenko, E, Alkeskjold, TT & Bjarklev, AO 2009, Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices. in Proceedings, OFC. IEEE, pp. 1-3, 2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC, San Diego, CA, United States, 22/03/2009.

Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices. / Wei, Lei; Khomtchenko, Elena; Alkeskjold, Thomas Tanggaard; Bjarklev, Anders Overgaard.

Proceedings, OFC. IEEE, 2009. p. 1-3.

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

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AU - Alkeskjold, Thomas Tanggaard

AU - Bjarklev, Anders Overgaard

N1 - Copyright: 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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M3 - Article in proceedings

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SP - 1

EP - 3

BT - Proceedings, OFC

PB - IEEE

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