Photolithography of thick photoresist coating in anisotropically etched V-grooves for electrically controlled liquid crystal photonic bandgap fiber devices

Lei Wei, Elena Khomtchenko, Thomas Tanggaard Alkeskjold, Anders Overgaard Bjarklev

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Abstract

Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.
Original languageEnglish
Title of host publicationProceedings, OFC
PublisherIEEE
Publication date2009
Pages1-3
ISBN (Print)978-1-4244-2606-5
Publication statusPublished - 2009
Event2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC - San Diego, CA, United States
Duration: 22 Mar 200926 Mar 2009

Conference

Conference2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC
CountryUnited States
CitySan Diego, CA
Period22/03/200926/03/2009

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