Thick photoresist coating for electrode patterning in anisotropically etched v-grooves is investigated. The photoresist coverage is compared with and without soft baking. Two-step exposure is applied for a complete exposure and minimizing the resolution loss.
|Title of host publication||Proceedings, OFC|
|Publication status||Published - 2009|
|Event||2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC - San Diego, CA, United States|
Duration: 22 Mar 2009 → 26 Mar 2009
|Conference||2009 Optical Fiber Communication Conference and Exposition and the National Fiber Optic Engineers Conference, OFC/NFOEC|
|City||San Diego, CA|
|Period||22/03/2009 → 26/03/2009|