Photocatalytic Nanostructuring of Graphene Guided by Block Copolymer Self-Assembly

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Abstract

Nanostructured graphene exhibits many intriguing properties. For example, precisely controlled graphene nanomeshes can be applied in electronic, photonic, or sensing devices. However, fabrication of nanopatterned graphene with periodic supperlattice remains a challenge. In this work, periodic graphene nanomesh was fabricated by photocatalysis of single-layer graphene suspended on top of TiO2-covered nanopillars, which were produced by combining block copolymer nanolithography with atomic layer deposition. Graphene nanoribbons were also prepared by the same method applied to a line-forming block copolymer template. This mask-free and nonchemical/nonplasma route offers an exciting platform for nanopatterning of graphene and other UV-transparent materials for device engineering.
Original languageEnglish
JournalA C S Applied Materials and Interfaces
Volume8
Issue number13
Pages (from-to)8329-8334
Number of pages6
ISSN1944-8244
DOIs
Publication statusPublished - 2016

Keywords

  • TiO2-covered nanopillars
  • block copolymer nanolithography
  • graphene nanomesh
  • selective-area photocatalysis
  • suspended graphene

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