Abstract
Resist-based lithography require the application of a layer of sacrificial resist for lift-off, etch masking or similar processes. Typical clean-room based resist spinners are expensive, and being situated in a clean room places strict requirements on sample cleanliness and materials compatibility. As a result, there is a strong need for low cost spinner systems outside of traditional cleanroom environments for development and fast device prototyping purposes. Such systems would enable application of thin resist layers for microfabrication prototyping in the academic, educational and hobbyist communities, with a low-cost barrier for entry
Original language | English |
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Publication date | 2018 |
Number of pages | 1 |
Publication status | Published - 2018 |
Event | 44th International conference on Micro and Nano Engineering - Copenhagen, Denmark Duration: 24 Sept 2018 → 27 Sept 2018 Conference number: 44 http://mne2018.org |
Conference
Conference | 44th International conference on Micro and Nano Engineering |
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Number | 44 |
Country/Territory | Denmark |
City | Copenhagen |
Period | 24/09/2018 → 27/09/2018 |
Internet address |
Keywords
- Spin coating
- Thin films
- Ellipsometry
- Optical mapping
- 3D printing
- PID and feed-forward controllers