Performance assessment of a low-cost spinner design

Amirali Abbaspourmani, Thomas Tølbøl Sørensen, Bjarke Sørensen Jessen, Patrick Rebsdorf Whelan, Mohammad Hossein Tarokh, Emil Højlund-Nielsen, Tim Booth*

*Corresponding author for this work

Research output: Contribution to conferencePosterResearchpeer-review

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Resist-based lithography require the application of a layer of sacrificial resist for lift-off, etch masking or similar processes. Typical clean-room based resist spinners are expensive, and being situated in a clean room places strict requirements on sample cleanliness and materials compatibility. As a result, there is a strong need for low cost spinner systems outside of traditional cleanroom environments for development and fast device prototyping purposes. Such systems would enable application of thin resist layers for microfabrication prototyping in the academic, educational and hobbyist communities, with a low-cost barrier for entry
Original languageEnglish
Publication date2018
Number of pages1
Publication statusPublished - 2018
Event44th International conference on Micro and Nano Engineering - Copenhagen, Denmark
Duration: 24 Sept 201827 Sept 2018
Conference number: 44


Conference44th International conference on Micro and Nano Engineering
Internet address


  • Spin coating
  • Thin films
  • Ellipsometry
  • Optical mapping
  • 3D printing
  • PID and feed-forward controllers


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