Patterning of a highly UV-transparent and chemically resistant thermoplast, Topas, by nanoimprint lithography

Theodor Nielsen, Daniel Nilsson, Oliver Geschke, Anders Kristensen

Research output: Contribution to conference › Paper › Research › peer-review

Original language	English
Publication date	2003
Publication status	Published - 2003
Event	Second International Conference on Nanoimprint and Nanoprint Technology (NNT) - Boston, MA, USA Duration: 1 Jan 2003 → …

Conference	Second International Conference on Nanoimprint and Nanoprint Technology (NNT)
City	Boston, MA, USA
Period	01/01/2003 → …

OpenUrl availability

@conference{6d794077779e43dcbdd33d5eac390e00,

title = "Patterning of a highly UV-transparent and chemically resistant thermoplast, Topas, by nanoimprint lithography",

author = "Theodor Nielsen and Daniel Nilsson and Oliver Geschke and Anders Kristensen",

year = "2003",

language = "English",

note = "Second International Conference on Nanoimprint and Nanoprint Technology (NNT) ; Conference date: 01-01-2003",

}

Patterning of a highly UV-transparent and chemically resistant thermoplast, Topas, by nanoimprint lithography. / Nielsen, Theodor; Nilsson, Daniel; Geschke, Oliver et al.
2003. Paper presented at Second International Conference on Nanoimprint and Nanoprint Technology (NNT), Boston, MA, USA.

Research output: Contribution to conference › Paper › Research › peer-review