P-type Al-doped Cr-deficient CrN thin films for thermoelectrics

Arnaud le Febvrier*, Ngo Van Nong, Gregory Abadias, Per Eklund

*Corresponding author for this work

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Abstract

Thermoelectric properties of chromium nitride (CrN)-based films grown on c-plane sapphire by dc reactive magnetron sputtering were investigated. In this work, aluminum doping was introduced in CrN (degenerate n-type semiconductor) by co-deposition. Under the present deposition conditions, over-stoichiometry in nitrogen (CrN1+δ) rock-salt structure is obtained. A p-type conduction is observed with nitrogen-rich CrN combined with aluminum doping. The Cr0.96Al0.04N1.17 film exhibited a high Seebeck coefficient and a sufficient power factor at 300 °C. These results are a starting point for designing p-type/n-type thermoelectric materials based on chromium nitride films, which are cheap and routinely grown on the industrial scale.
Original languageEnglish
Article number051003
JournalApplied Physics Express
Volume11
Issue number5
Number of pages4
ISSN1882-0778
DOIs
Publication statusPublished - 2018

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