Orientation and Alignment Control of Microphase-Separated PS‑b‑PDMS Substrate Patterns via Polymer Brush Chemistry

Engineering

• Polydimethylsiloxane 100%
• Nanoscale 66%
• Silicon Substrate 33%
• Substrate Surface 33%
• Homopolymer 33%
• Feature Size 33%
• Smallest Feature 33%
• Pattern Transfer 33%
• Random Copolymer 33%
• Microphase Separation 33%

Material Science

• Polystyrene 100%
• Polymer Brush 100%
• Copolymer 33%
• Block Copolymer 33%
• Film 33%
• Silicon 33%

Keyphrases

• Alignment Control 100%
• Feature Formation 33%
• Three-dimensional Film 33%
• Copolymer Brush 33%
• Structure Orientation 33%
• Control Instability 33%
• Structure Alignment 33%