Organic ice resists for 3D electron-beam processing: Instrumentation and operation

William Tiddi*, Anna Elsukova, Marco Beleggia, Anpan Han

*Corresponding author for this work

    Research output: Contribution to journalJournal articleResearchpeer-review

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    Abstract

    Organic vapors condensed into thin layers of ice on the surface of a cold substrate are exposed with an electron beam to create resist patterns for lithography applications. The entire spin- and development-free lithography process requires a single custom instrument. We report the design, material choice, implementation and operation of this apparatus. It is based on a scanning electron microscope fitted with an electron beam control system that is normally used for electron beam lithography in a multi-user open-access laboratory. The microscope was also equipped with a gas injection system, a liquid nitrogen cooled cryostage, a temperature control system, and a load-lock. Three steps are required to initialize the apparatus for organic ice resist processing, and two steps are required to restore the apparatus for routine multi-user operations. Five steps are needed to create organic ice resist patterns. Finally, by stacking nanoscale patterns made in organic ice we created 3D structures using two complementary cyclic condense, expose and sublimate processes.
    Original languageEnglish
    JournalMicroelectronic Engineering
    Volume192
    Pages (from-to)38-43
    ISSN0167-9317
    DOIs
    Publication statusPublished - 2018

    Keywords

    • Electron beam lithography
    • Negative tone resist
    • Organic ice resist
    • Multilayer resist
    • 3D lithography

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