Organic ice resists

William Tiddi, Anna Elsukova, Hoa Thanh Le, Pei Liu, Marco Beleggia, Anpan Han

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Electron-beam lithography (EBL) is the backbone technology for patterning nanostructures and manufacturing nanodevices. It involves processing and handling synthetic resins in several steps, each requiring optimization and dedicated instrumentation in cleanroom environments. Here, we show that simple organic molecules, e.g. alcohols, condensed to form thin-films at low temperature demonstrate resist-like capabilities for EBL applications and beyond. The entire lithographic process takes place in a single instrument, and avoids exposing chemicals to the user and the need of cleanrooms. Unlike EBL that requires large samples with optically flat surfaces, we patterned on fragile membranes only 5-nm-thin, and 2 x 2 mm2 diamond samples. We created patterns on the nm to sub-mm scale, as well as three-dimensional structures by stacking layers of frozen organic molecules. Finally, using plasma etching, the organic ice resist (OIR) patterns are used to structure the underlying material, and thus enable nanodevice fabrication.
    Original languageEnglish
    JournalNano letters
    Volume17
    Issue number12
    Pages (from-to)7886−7891
    ISSN1530-6984
    DOIs
    Publication statusPublished - 2017

    Keywords

    • Electron-beam lithography
    • Condensed organic molecules
    • Ice lithography
    • Focused electron-beam induced deposition
    • 3D lithography
    • Nanostructured diamond

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