Organic ice resist lithography with an environmental TEM

Anna Elsukova, Anpan Han, Marco Beleggia

    Research output: Contribution to conferenceConference abstract for conferenceResearchpeer-review

    72 Downloads (Pure)
    Original languageEnglish
    Publication date2018
    Number of pages1
    Publication statusPublished - 2018
    Event69th Annual Conference of the Nordic Microscopy Society - Technical University of Denmark, Kgs. Lyngby, Denmark
    Duration: 25 Jun 201828 Jun 2018
    Conference number: 69
    http://www.scandem2018.com
    http://www.cen.dtu.dk/english/scandem-2018

    Conference

    Conference69th Annual Conference of the Nordic Microscopy Society
    Number69
    LocationTechnical University of Denmark
    CountryDenmark
    CityKgs. Lyngby
    Period25/06/201828/06/2018
    Internet address

    Cite this

    Elsukova, A., Han, A., & Beleggia, M. (2018). Organic ice resist lithography with an environmental TEM. Abstract from 69th Annual Conference of the Nordic Microscopy Society, Kgs. Lyngby, Denmark.