Organic ice resist lithography with an environmental TEM

Research output: Contribution to conference › Conference abstract for conference › Research › peer-review

131 Downloads (Pure)

Original language	English
Publication date	2018
Number of pages	1
Publication status	Published - 2018
Event	69th Annual Conference of the Nordic Microscopy Society - Technical University of Denmark, Kgs. Lyngby, Denmark Duration: 25 Jun 2018 → 28 Jun 2018 Conference number: 69 http://www.scandem2018.com http://www.cen.dtu.dk/english/scandem-2018

Conference	69th Annual Conference of the Nordic Microscopy Society
Number	69
Location	Technical University of Denmark
Country/Territory	Denmark
City	Kgs. Lyngby
Period	25/06/2018 → 28/06/2018
Internet address	http://www.scandem2018.com http://www.cen.dtu.dk/english/scandem-2018

Access to Document

@conference{29e49a0f08cd4263a81ba8db80d5eec5,

title = "Organic ice resist lithography with an environmental TEM",

author = "Anna Elsukova and Anpan Han and Marco Beleggia",

year = "2018",

language = "English",

note = "69th Annual Conference of the Nordic Microscopy Society, Scandem 2018 ; Conference date: 25-06-2018 Through 28-06-2018",

url = "http://www.scandem2018.com, http://www.cen.dtu.dk/english/scandem-2018",

}