Optimization of FIB milling for rapid NEMS prototyping

Bjarke Malm, Dirch Hjorth Petersen, Anders Lei, Tim Booth, Lasse Vinther Homann, Peter Bøggild

    Research output: Contribution to journalConference articleResearchpeer-review

    Abstract

    We demonstrate an optimized milling technique to focused ion beam (FIB) milling in template silicon membranes for fast prototyping of nanoelectromechanical systems (NEMS). Using a single-pass milling strategy the highly topology dependent sputtering rate is boosted and shorter milling time is achieved. Drift independence is obtained for small critical features using a radial scan strategy, and a back scan routine ensures minimal line width deviation removing redeposited material. Milling a design similar to a nano four-point probe with a pitch down to 400nm we display what optimized FIB milling in NEMS development can accomplish.
    Original languageEnglish
    JournalMicroelectronic Engineering
    Volume88
    Issue number8
    Pages (from-to)2671-2674
    ISSN0167-9317
    DOIs
    Publication statusPublished - 2011
    Event36th International Conference on Micro- and Nano-Engineering - Genoa, Italy
    Duration: 19 Sep 201022 Sep 2010
    Conference number: 36
    http://www.mne2010.org/

    Conference

    Conference36th International Conference on Micro- and Nano-Engineering
    Number36
    CountryItaly
    CityGenoa
    Period19/09/201022/09/2010
    Internet address

    Keywords

    • Redeposition
    • Drift
    • Prototyping
    • Focused Ion Beam
    • NEMS

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