We demonstrate an optimized milling technique to focused ion beam (FIB) milling in template silicon membranes for fast prototyping of nanoelectromechanical systems (NEMS). Using a single-pass milling strategy the highly topology dependent sputtering rate is boosted and shorter milling time is achieved. Drift independence is obtained for small critical features using a radial scan strategy, and a back scan routine ensures minimal line width deviation removing redeposited material. Milling a design similar to a nano four-point probe with a pitch down to 400nm we display what optimized FIB milling in NEMS development can accomplish.
|Publication status||Published - 2011|
|Event||36th International Conference on Micro- and Nano-Engineering - Genoa, Italy|
Duration: 19 Sep 2010 → 22 Sep 2010
Conference number: 36
|Conference||36th International Conference on Micro- and Nano-Engineering|
|Period||19/09/2010 → 22/09/2010|
- Focused Ion Beam