On the similarities between micro/nano lithography and topology optimization projection methods

Miche Jansen, Boyan Stefanov Lazarov, Mattias Schevenels, Ole Sigmund

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

The aim of this paper is to incorporate a model for micro/nano lithography production processes in topology optimization. The production process turns out to provide a physical analogy for projection filters in topology optimization. Blueprints supplied by the designers cannot be directly used as inputs to lithographic processes due to the proximity effect which causes rounding of sharp corners and geometric interaction of closely spaced design elements. Therefore, topology optimization is applied as a tool for proximity effect correction. Furthermore, it is demonstrated that the robust projection filter can be used to account for uncertainties due to lithographic production processes which results in manufacturable blueprint designs and eliminates the need for subsequent corrections.
Original languageEnglish
JournalStructural and Multidisciplinary Optimization
Volume48
Issue number4
Pages (from-to)717-730
ISSN1615-147X
DOIs
Publication statusPublished - 2013

Keywords

  • Topology optimization
  • Electron beam lithography
  • Proximity effects
  • Robust design
  • Projection filters
  • Design regularization

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