On the chemical diffusion in layered thin films containing amorphous Co-Zr, Ni-Zr, and Fe-Zr

N. Karpe, Jørgen Bøttiger, A. L. Greer, Jakob Janting, K. K. Larsen

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

The chemical diffusion in thin trilayer films of TM-TM100−xZrx-TM with an amorphous middle layer where TM=Co, Hi, or Fe and in amorphous Fe-Zr and Ni-Zr films with composition gradients has been investigated using Rutherford backscattering spectrometry. The growth of the amorphous layer in the trilayers, due to in-diffusion of cobalt and nickel, is initially found to be proportional to the square root of the time, t1/2, and subsequently found to level off before the compositions corresponding to metastable equilibria are reached. Irradiation, with 500 keV Xe+ ions, is found to promote the in-diffusion. This behavior is discussed in terms of structural relaxation effects and their influence on the metastable equilibrium. In amorphous Fe-Zr the chemical diffusivity is observed to be very sluggish. Contrary to the behavior in Co-Zr and Ni-Zr trilayers, the direction of the iron diffusion in Fe-Zr trilayers suggests a broad positive peak in the Gibbs free energy at a composition around 50 at.% Zr.
Original languageEnglish
JournalJournal of Materials Research
Volume7
Issue number4
Pages (from-to)926-933
ISSN0884-2914
Publication statusPublished - 1992
Externally publishedYes

Keywords

  • Diffusion - Radiation Effects
  • Films - Growing
  • Spectrometry
  • Transition Metals - Amorphous
  • Transition Metals - Stability
  • Transition Metals
  • X
  • Layered Thin Films
  • Rutherford Backscattering Spectrometry

Fingerprint Dive into the research topics of 'On the chemical diffusion in layered thin films containing amorphous Co-Zr, Ni-Zr, and Fe-Zr'. Together they form a unique fingerprint.

Cite this