Abstract
Disclosed is a method for self-organization of a nanostructure, comprising the steps of, providing a narrow-band light source having a center wavelength; providing a film on a substrate, said thin film having a film thickness, said film thickness being in the range from 0.9 to 1.1 times a Fabry Perot resonance condition thickness for said center wavelength; and irradiating said film, the irradiating comprises using said narrow-band light source to induce self-organization of said film, thereby obtaining nanostructures. A product comprising a substrate and nanostructures produced by said method is further disclosed.
| Original language | English |
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| IPC | G03F 7/ 00 A I |
| Patent number | WO2020249176 |
| Filing date | 11/06/2020 |
| Country/Territory | International Bureau of the World Intellectual Property Organization (WIPO) |
| Priority date | 11/06/2019 |
| Priority number | EP20190179464 |
| Publication status | Published - 17 Dec 2020 |