Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures

Yiyu Ou, Valdas Jokubavicius, Rositza Yakimova, Mikael Syväjärvi, Haiyan Ou

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In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern. © 2012 Optical Society of America.
Original languageEnglish
JournalOptics Letters
Issue number18
Pages (from-to)3816-3818
Publication statusPublished - 2012

Bibliographical note

© Optical Society of America


  • Contact angle
  • Silicon carbide
  • Surface chemistry
  • Fluorescence

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