In the present work, an approach of fabricating pseudoperiodic antireflective subwavelength structures (ARS) on fluorescent SiC by using self-assembled etch mask is demonstrated. By applying the pseudoperiodic (ARS), the average surface reflectance at 6° incidence over the spectral range of 390-785 nm is dramatically suppressed from 20.5% to 1.62%, and the hydrophobic surface with a large contact angle of 98° is also achieved. The angle-resolved photoluminescence study presents a considerable omnidirectional luminescence enhancement with an integral intensity enhancement of 66.3% and a fairly preserved spatial emission pattern. © 2012 Optical Society of America.
Bibliographical note© Optical Society of America
- Contact angle
- Silicon carbide
- Surface chemistry
Ou, Y., Jokubavicius, V., Yakimova, R., Syväjärvi, M., & Ou, H. (2012). Omnidirectional luminescence enhancement of fluorescent SiC via pseudoperiodic antireflective subwavelength structures. Optics Letters, 37(18), 3816-3818. https://doi.org/10.1364/OL.37.003816