Numerical modeling of tomographic volumetric additive manufacturing based on energy threshold method

Tomographic Volumetric Additive Manufacturing (TVAM) has emerged as a rapid and efficient additive manufacturing method, overcoming many limitations of traditional approaches. While the technology is still advancing toward industrial adoption, there is a need to enhance the geometric fidelity especially for small features. This study introduces a new, computationally efficient numerical model for TVAM based on exposure thresholds, designed to optimize material and process parameters. The model requires only two parameters: the energy threshold and penetration depth. Using the Jaccard Similarity Index (JSI), the study demonstrates that an optimal range for penetration depth exists, dependent on the process parameters. Lower penetration depths negatively impact print quality, while higher values increase curing time, making the part vulnerable to sedimentation and oxygen diffusion. The study also finds that projection intensity primarily influences print time and does not affect the JSI. Additionally, it is shown that temporal sampling and rotation rate are interlinked; higher rotation rates necessitate shorter temporal sampling intervals to maintain quality. Scaling up the size of the vial and the print requires adjustments in both the penetration depth and light source intensity to preserve optimal quality. Finally, it is shown that the relative size of the print to the vial influences print quality, with smaller ratios yielding slightly lower quality.