Novel method for chemical modification and patterning of the SU-8 photoresist

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    Abstract

    In this paper we describe a new photochemical method to tailor and pattern the surface of SU-8 negative photoresist. Antraquinone (AQ) derivatives were used to chemically modify and pattern SU-8 surfaces. Using AQ derivatives with electophilic moieties (AQ-E), we could chemo-selectively change the wetting behaviour of SU-8. The resolution limit of the AQ photopatterning method was 20 μm when using an uncollimated light source. AQ modification followed by a reaction with amino groups of Alexa-647 cadaverine and a Biotin-amino derivative proved possible modification and patterning of polymeric cantilevers and other MEMS based sensors with biomolecules.
    Original languageEnglish
    Title of host publicationProceedings of MicroTAS 2007
    Publication date2007
    Pages1027-1030
    Publication statusPublished - 2007
    Event11th International Conference on Miniaturized Systems for Chemistry and Life Sciences - Paris, France
    Duration: 7 Oct 200711 Oct 2007
    Conference number: 11
    http://www.microtasconferences.org/microtas2007/

    Conference

    Conference11th International Conference on Miniaturized Systems for Chemistry and Life Sciences
    Number11
    CountryFrance
    CityParis
    Period07/10/200711/10/2007
    Internet address

    Keywords

    • SU-8
    • photopatterning
    • polymer functionalization

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