Novel method for chemical modification and patterning of the SU-8 photoresist

Gabriela Blagoi; Stephan Urs Keller; Anja Boisen; Mogens Havsteen Jakobsen

Novel method for chemical modification and patterning of the SU-8 photoresist

Gabriela Blagoi, Stephan Urs Keller, Anja Boisen, Mogens Havsteen Jakobsen

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Abstract

In this paper we describe a new photochemical method to tailor and pattern the surface of SU-8 negative photoresist. Antraquinone (AQ) derivatives were used to chemically modify and pattern SU-8 surfaces. Using AQ derivatives with electophilic moieties (AQ-E), we could chemo-selectively change the wetting behaviour of SU-8. The resolution limit of the AQ photopatterning method was 20 μm when using an uncollimated light source. AQ modification followed by a reaction with amino groups of Alexa-647 cadaverine and a Biotin-amino derivative proved possible modification and patterning of polymeric cantilevers and other MEMS based sensors with biomolecules.

Original language	English
Title of host publication	Proceedings of MicroTAS 2007
Publication date	2007
Pages	1027-1030
Publication status	Published - 2007
Event	11th International Conference on Miniaturized Systems for Chemistry and Life Sciences - Paris, France Duration: 7 Oct 2007 → 11 Oct 2007 Conference number: 11 http://www.microtasconferences.org/microtas2007/

Conference

Conference	11th International Conference on Miniaturized Systems for Chemistry and Life Sciences
Number	11
Country/Territory	France
City	Paris
Period	07/10/2007 → 11/10/2007
Internet address	http://www.microtasconferences.org/microtas2007/

Keywords

SU-8
photopatterning
polymer functionalization

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http://www.mic.dtu.dk/upload/institutter/mic/forskning/bioprobe/publications/blagoi%20-%20utas2007.pdf

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@inproceedings{c2e68e600b714074a6faef9ff5153d1c,

title = "Novel method for chemical modification and patterning of the SU-8 photoresist",

abstract = "In this paper we describe a new photochemical method to tailor and pattern the surface of SU-8 negative photoresist. Antraquinone (AQ) derivatives were used to chemically modify and pattern SU-8 surfaces. Using AQ derivatives with electophilic moieties (AQ-E), we could chemo-selectively change the wetting behaviour of SU-8. The resolution limit of the AQ photopatterning method was 20 μm when using an uncollimated light source. AQ modification followed by a reaction with amino groups of Alexa-647 cadaverine and a Biotin-amino derivative proved possible modification and patterning of polymeric cantilevers and other MEMS based sensors with biomolecules.",

keywords = "SU-8, photopatterning, polymer functionalization",

author = "Gabriela Blagoi and Keller, {Stephan Urs} and Anja Boisen and Jakobsen, {Mogens Havsteen}",

year = "2007",

language = "English",

pages = "1027--1030",

booktitle = "Proceedings of MicroTAS 2007",

note = "11th International Conference on Miniaturized Systems for Chemistry and Life Sciences, µTAS 2007 ; Conference date: 07-10-2007 Through 11-10-2007",

url = "http://www.microtasconferences.org/microtas2007/",

}

Blagoi, G, Keller, SU , Boisen, A & Jakobsen, MH 2007, Novel method for chemical modification and patterning of the SU-8 photoresist. in Proceedings of MicroTAS 2007. pp. 1027-1030, 11th International Conference on Miniaturized Systems for Chemistry and Life Sciences, Paris, France, 07/10/2007. <http://www.mic.dtu.dk/upload/institutter/mic/forskning/bioprobe/publications/blagoi%20-%20utas2007.pdf>

TY - GEN

T1 - Novel method for chemical modification and patterning of the SU-8 photoresist

AU - Blagoi, Gabriela

AU - Keller, Stephan Urs

AU - Boisen, Anja

AU - Jakobsen, Mogens Havsteen

N1 - Conference code: 11

PY - 2007

Y1 - 2007

N2 - In this paper we describe a new photochemical method to tailor and pattern the surface of SU-8 negative photoresist. Antraquinone (AQ) derivatives were used to chemically modify and pattern SU-8 surfaces. Using AQ derivatives with electophilic moieties (AQ-E), we could chemo-selectively change the wetting behaviour of SU-8. The resolution limit of the AQ photopatterning method was 20 μm when using an uncollimated light source. AQ modification followed by a reaction with amino groups of Alexa-647 cadaverine and a Biotin-amino derivative proved possible modification and patterning of polymeric cantilevers and other MEMS based sensors with biomolecules.

AB - In this paper we describe a new photochemical method to tailor and pattern the surface of SU-8 negative photoresist. Antraquinone (AQ) derivatives were used to chemically modify and pattern SU-8 surfaces. Using AQ derivatives with electophilic moieties (AQ-E), we could chemo-selectively change the wetting behaviour of SU-8. The resolution limit of the AQ photopatterning method was 20 μm when using an uncollimated light source. AQ modification followed by a reaction with amino groups of Alexa-647 cadaverine and a Biotin-amino derivative proved possible modification and patterning of polymeric cantilevers and other MEMS based sensors with biomolecules.

KW - SU-8

KW - photopatterning

KW - polymer functionalization

M3 - Article in proceedings

SP - 1027

EP - 1030

BT - Proceedings of MicroTAS 2007

T2 - 11th International Conference on Miniaturized Systems for Chemistry and Life Sciences

Y2 - 7 October 2007 through 11 October 2007

ER -

Novel method for chemical modification and patterning of the SU-8 photoresist

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