Novel 3D microelectrodes and pipettes by wet and dry etching

Maria Dimaki, Patricia Vazquez, Alessandro Aimone, Mark H. Olsen, Luigi Sasso, Romen Rodriguez-Trujillo, Winnie E. Svendsen

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    The purpose of this work is to develop novel 3D micro- and nanoelectrodes and pipettes by use of carefully optimised standard microfabrication techniques such as wet (by KOH) and dry silicon etching. Two types of electrodes have been fabricated and characterized: small nanoelectrodes to be used for localised measurements on cell cultures and high aspect ratio scalloped microelectrodes for measurements in brain slices. This paper presents improved fabrication processes for both types of electrodes and the pipettes, as well as the electrical and electrochemical characterization of the small electrodes in order to confirm their functionality. Although functional, an increase in the electrode surface area is needed if they are to be used for electrophysiological measurements. Finally, the pipettes fabricated have openings of the order of 500nm, which makes them ideal candidates for localised stimulation of cell or brain slice cultures.
    Original languageEnglish
    JournalMicroelectronic Engineering
    Volume100
    Pages (from-to)33-36
    ISSN0167-9317
    DOIs
    Publication statusPublished - 2012

    Keywords

    • Micro- and nanoelectrodes
    • Fabrication techniques
    • Electrical characterization
    • Electrochemical characterization

    Fingerprint Dive into the research topics of 'Novel 3D microelectrodes and pipettes by wet and dry etching'. Together they form a unique fingerprint.

    Cite this