Negative UV-NIL (NUV-NIL) - A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

L. H. D. Skjolding, G. T. Teixidor, J. Emneus, Lars Montelius

Research output: Contribution to journalConference articleResearchpeer-review

Abstract

This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.
Original languageEnglish
JournalMicroelectronic Engineering
Volume86
Issue number4-6
Pages (from-to)654-656
ISSN0167-9317
DOIs
Publication statusPublished - 2009

Keywords

  • SU-8 2005
  • UV lithography
  • Alignment strategy
  • NIL
  • Mix-and-match lithography
  • Interdigitated electrodes

Fingerprint Dive into the research topics of 'Negative UV-NIL (NUV-NIL) - A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures'. Together they form a unique fingerprint.

Cite this