Negative UV-NIL (NUV-NIL) - A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

L. H. D. Skjolding; G. T. Teixidor; J. Emneus; Lars Montelius

doi:10.1016/j.mee.2008.12.077

Negative UV-NIL (NUV-NIL) - A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

L. H. D. Skjolding, G. T. Teixidor, J. Emneus, Lars Montelius

Department of Physics

Research output: Contribution to journal › Conference article › Research › peer-review

Abstract

This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.

Original language	English
Journal	Microelectronic Engineering
Volume	86
Issue number	4-6
Pages (from-to)	654-656
ISSN	0167-9317
DOIs	https://doi.org/10.1016/j.mee.2008.12.077
Publication status	Published - 2009

Keywords

SU-8 2005
UV lithography
Alignment strategy
NIL
Mix-and-match lithography
Interdigitated electrodes

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10.1016/j.mee.2008.12.077

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title = "Negative UV-NIL (NUV-NIL) - A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures",

abstract = "This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.",

keywords = "SU-8 2005, UV lithography, Alignment strategy, NIL, Mix-and-match lithography, Interdigitated electrodes",

author = "Skjolding, {L. H. D.} and Teixidor, {G. T.} and J. Emneus and Lars Montelius",

year = "2009",

doi = "10.1016/j.mee.2008.12.077",

language = "English",

volume = "86",

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journal = "Microelectronic Engineering",

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AU - Skjolding, L. H. D.

AU - Teixidor, G. T.

AU - Emneus, J.

AU - Montelius, Lars

PY - 2009

Y1 - 2009

N2 - This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.

AB - This paper presents a novel strategy for aligning patterns created with nano-imprint lithography (NIL) and UV lithography, similar to a mix-and-match process, which allows for the fabrication of large and small features in a single layer of resist. The resin used to demonstrate this new imprinting scheme is SU-8, a very widely used negative photoresist. Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes.

KW - SU-8 2005

KW - UV lithography

KW - Alignment strategy

KW - NIL

KW - Mix-and-match lithography

KW - Interdigitated electrodes

U2 - 10.1016/j.mee.2008.12.077

DO - 10.1016/j.mee.2008.12.077

M3 - Conference article

SN - 0167-9317

VL - 86

SP - 654

EP - 656

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 4-6

ER -

Negative UV-NIL (NUV-NIL) - A mix-and-match NIL and UV strategy for realisation of nano- and micrometre structures

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Keywords

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