Nanoscale silicon structures by using carbon nanotubes as reactive ion etch masks

Michael Stenbæk Schmidt, Theodor Nielsen, Dorte Nørgaard Madsen, Anders Kristensen, Peter Bøggild

Research output: Contribution to journal › Journal article › Research › peer-review

Cite this

@article{f987c999afb147d1878ef47084207ecf,

title = "Nanoscale silicon structures by using carbon nanotubes as reactive ion etch masks",

author = "Schmidt, {Michael Stenb{\ae}k} and Theodor Nielsen and Madsen, {Dorte N{\o}rgaard} and Anders Kristensen and Peter B{\o}ggild",

year = "2005",

language = "English",

volume = "16",

pages = "750--753",

journal = "Nanotechnology",

issn = "0957-4484",

publisher = "IOP Publishing",

number = "6",

}