Nanoscale silicon structures by using carbon nanotubes as reactive ion etch masks

Michael Stenbæk Schmidt, Theodor Nielsen, Dorte Nørgaard Madsen, Anders Kristensen, Peter Bøggild

    Research output: Contribution to journalJournal articleResearchpeer-review

    Original languageEnglish
    JournalNanotechnology
    Volume16
    Issue number6
    Pages (from-to)750-753
    ISSN0957-4484
    Publication statusPublished - 2005

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