Nanoscale depression formation for substrate surface involves bringing immersed object proximal to surface of substrate by applying two sets of operating parameters

Qijin Chi (Inventor), Jingdong Zhang (Inventor), Jens Enevold Thaulov Andersen (Inventor), Jens Ulstrup (Inventor), Esben P. Friis (Inventor)

Research output: Patent

Abstract

NOVELTY - An object, partially immersed into a liquid environment, is brought proximal to the surface of a substrate by applying two sets of operating parameters including a bias voltage, a tunnel current and a working potential. The bias voltage of one operating parameter is negative. USE - For substrate surface. ADVANTAGE - Controls pit size and pattern of nanoscale depression. DESCRIPTION OF DRAWING(S) - The figure shows the schematic drawing of a scanning tunneling microscope tip and a substrate during formation and imaging of nanopits.
Original languageEnglish
Patent numberUS6398940-B1
CountryUnited States
Publication statusPublished - 2000
Externally publishedYes

Bibliographical note

Patent:
Country: Denmark
No.: DK200000188-A

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