Abstract
M. S. Schmidt et al. describe on page OP11 a simple, two-step fabrication process to as-semble flexible, freestanding nanopillars into large-area substrates. These substrates can be made using readily available silicon-processing equipment and are suitable for SERS, having a large, uniform Raman enhancement.
Original language | English |
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Journal | Advanced Materials |
Volume | 24 |
Issue number | 10 |
ISSN | 0935-9648 |
DOIs | |
Publication status | Published - 2012 |
Keywords
- Surface enhanced raman spectroscopy
- Substrate fabrication
- Maskless reactive ion etching
- Leaning silicon nanopillars;
- Hot spots