M. S. Schmidt et al. describe on page OP11 a simple, two-step fabrication process to as-semble flexible, freestanding nanopillars into large-area substrates. These substrates can be made using readily available silicon-processing equipment and are suitable for SERS, having a large, uniform Raman enhancement.
- Surface enhanced raman spectroscopy
- Substrate fabrication
- Maskless reactive ion etching
- Leaning silicon nanopillars;
- Hot spots