Nanoimprinting reflow modified moth-eye structures in chalcogenide glass for enhanced broadband antireflection in the mid-infrared

Mikkel Lotz, Julius Needham, Mogens H. Jakobsen, Rafael Taboryski*

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

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Abstract

We report on the progress towards developing a new method for fabricating more efficient, broadband antireflective (AR) moth-eye structures in As2Se3 via a direct nanoimprinting technique. Thermal reflow is used during mold fabrication to reshape a conventional deep-ultraviolet lithography in order to promote a pattern transfer of “secant ogive”-like moth-eye structures. Once replicated, structures modified by reflow displayed greater AR efficiency compared to structures replicated by a conventional mold, achieving the highest spectrum-averaged transmittance improvement of 12.36% from 3.3 to 12 μm.
Original languageEnglish
JournalOptics Letters
Volume44
Issue number17
Pages (from-to)4383-4386
Number of pages4
ISSN0146-9592
DOIs
Publication statusPublished - 2019

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