Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices

Brian Bilenberg Olsen; Lars Hagedorn Frandsen; Theodor Nielsen; Marco Vogler; Peter Ingo Borel; Anders Kristensen

doi:10.1109/CLEO.2006.4628228

Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices

Brian Bilenberg Olsen
, Lars Hagedorn Frandsen
, Theodor Nielsen
, Marco Vogler
, Peter Ingo Borel
, Anders Kristensen

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

617 Downloads (Orbit)

Abstract

We demonstrate a nanoimprint process for fabrication of photonic crystal devices. The nanoimprint process, defining stamp patterns in a thin e-beam resist, yields improved pattern replication compared to direct e-beam writing of the devices.

Original language	English
Title of host publication	Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006.
Publisher	IEEE
Publication date	2006
Article number	4628228
ISBN (Print)	978-1-55752-813-1
DOIs	https://doi.org/10.1109/CLEO.2006.4628228
Publication status	Published - 2006
Event	Conference on Lasers and Electro Optics, Quantum Electronics and Laser Science Conference, Conference on Photonic Applications, Systems and Technologies 2006 - Long Beach, CA, United States Duration: 21 May 2006 → 26 May 2006 http://www.cleoconference.org/osa.cleo/media/Default/Archive/CLEO-Archive-2006.pdf

Conference

Conference	Conference on Lasers and Electro Optics, Quantum Electronics and Laser Science Conference, Conference on Photonic Applications, Systems and Technologies 2006
Country/Territory	United States
City	Long Beach, CA
Period	21/05/2006 → 26/05/2006
Internet address	http://www.cleoconference.org/osa.cleo/media/Default/Archive/CLEO-Archive-2006.pdf

Bibliographical note

Copyright: 2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

Access to Document

10.1109/CLEO.2006.4628228

BilenbergFinal published version, 420 KB

OpenUrl availability

Full text

Cite this

@inproceedings{3884b11eead5448eb9edac0b5ecb3871,

title = "Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices",

abstract = "We demonstrate a nanoimprint process for fabrication of photonic crystal devices. The nanoimprint process, defining stamp patterns in a thin e-beam resist, yields improved pattern replication compared to direct e-beam writing of the devices.",

author = "Olsen, \{Brian Bilenberg\} and Frandsen, \{Lars Hagedorn\} and Theodor Nielsen and Marco Vogler and Borel, \{Peter Ingo\} and Anders Kristensen",

note = "Copyright: 2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE; Conference on Lasers and Electro Optics, Quantum Electronics and Laser Science Conference, Conference on Photonic Applications, Systems and Technologies 2006, CLEO/QELS/PhAST ; Conference date: 21-05-2006 Through 26-05-2006",

year = "2006",

doi = "10.1109/CLEO.2006.4628228",

language = "English",

isbn = "978-1-55752-813-1",

booktitle = "Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006.",

publisher = "IEEE",

address = "United States",

url = "http://www.cleoconference.org/osa.cleo/media/Default/Archive/CLEO-Archive-2006.pdf",

}

Olsen, BB, Frandsen, LH, Nielsen, T, Vogler, M, Borel, PI & Kristensen, A 2006, Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices. in Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006.., 4628228, IEEE, Conference on Lasers and Electro Optics, Quantum Electronics and Laser Science Conference, Conference on Photonic Applications, Systems and Technologies 2006, Long Beach, CA, United States, 21/05/2006. https://doi.org/10.1109/CLEO.2006.4628228

Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices. / Olsen, Brian Bilenberg; Frandsen, Lars Hagedorn; Nielsen, Theodor et al.
Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006.. IEEE, 2006. 4628228.

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

TY - GEN

T1 - Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices

AU - Olsen, Brian Bilenberg

AU - Frandsen, Lars Hagedorn

AU - Nielsen, Theodor

AU - Vogler, Marco

AU - Borel, Peter Ingo

AU - Kristensen, Anders

N1 - Copyright: 2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

PY - 2006

Y1 - 2006

N2 - We demonstrate a nanoimprint process for fabrication of photonic crystal devices. The nanoimprint process, defining stamp patterns in a thin e-beam resist, yields improved pattern replication compared to direct e-beam writing of the devices.

AB - We demonstrate a nanoimprint process for fabrication of photonic crystal devices. The nanoimprint process, defining stamp patterns in a thin e-beam resist, yields improved pattern replication compared to direct e-beam writing of the devices.

U2 - 10.1109/CLEO.2006.4628228

DO - 10.1109/CLEO.2006.4628228

M3 - Article in proceedings

SN - 978-1-55752-813-1

BT - Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006.

PB - IEEE

T2 - Conference on Lasers and Electro Optics, Quantum Electronics and Laser Science Conference, Conference on Photonic Applications, Systems and Technologies 2006

Y2 - 21 May 2006 through 26 May 2006

ER -

Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices

Abstract

Conference

Bibliographical note

Access to Document

OpenUrl availability

Fingerprint

Cite this