Nanoimprint Lithography of Topology Optimized Photonic Crystal Devices

Brian Bilenberg Olsen, Lars Hagedorn Frandsen, Theodor Nielsen, Marco Vogler, Peter Ingo Borel, Anders Kristensen

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

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    Abstract

    We demonstrate a nanoimprint process for fabrication of photonic crystal devices. The nanoimprint process, defining stamp patterns in a thin e-beam resist, yields improved pattern replication compared to direct e-beam writing of the devices.
    Original languageEnglish
    Title of host publicationConference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006.
    PublisherIEEE
    Publication date2006
    Article number4628228
    ISBN (Print)978-1-55752-813-1
    DOIs
    Publication statusPublished - 2006
    EventConference on Lasers and Electro Optics, Quantum Electronics and Laser Science Conference, Conference on Photonic Applications, Systems and Technologies 2006 - Long Beach, CA, United States
    Duration: 21 May 200626 May 2006
    http://www.cleoconference.org/osa.cleo/media/Default/Archive/CLEO-Archive-2006.pdf

    Conference

    ConferenceConference on Lasers and Electro Optics, Quantum Electronics and Laser Science Conference, Conference on Photonic Applications, Systems and Technologies 2006
    Country/TerritoryUnited States
    CityLong Beach, CA
    Period21/05/200626/05/2006
    Internet address

    Bibliographical note

    Copyright: 2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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