Nanoimprint lithography in Topas, a highly UV-transparent and chemically reisistant thermoplast

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Original language	English
Title of host publication	Conference Digests of the IEEE sponsored Conference on Nanoscale Devices & System Integration (NDSI)
Number of pages	73
Publication date	2004
Publication status	Published - 2004

OpenUrl availability

@inproceedings{4334b8a9706243acb47aac3bc05210c3,

title = "Nanoimprint lithography in Topas, a highly UV-transparent and chemically reisistant thermoplast",

author = "Theodor Nielsen and Daniel Nilsson and Oliver Geschke and Peixiong Shi and Anders Kristensen",

year = "2004",

language = "English",

booktitle = "Conference Digests of the IEEE sponsored Conference on Nanoscale Devices \& System Integration (NDSI)",

}

Nanoimprint lithography in Topas, a highly UV-transparent and chemically reisistant thermoplast. / Nielsen, Theodor; Nilsson, Daniel; Geschke, Oliver et al.
Conference Digests of the IEEE sponsored Conference on Nanoscale Devices & System Integration (NDSI). 2004.

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

TY - GEN

T1 - Nanoimprint lithography in Topas, a highly UV-transparent and chemically reisistant thermoplast

AU - Nielsen, Theodor

AU - Nilsson, Daniel

AU - Geschke, Oliver

AU - Shi, Peixiong

AU - Kristensen, Anders

PY - 2004

Y1 - 2004

M3 - Article in proceedings

BT - Conference Digests of the IEEE sponsored Conference on Nanoscale Devices & System Integration (NDSI)

ER -