Nanoimprint lithography in Topas, a highly UV-transparent and chemically reisistant thermoplast

Theodor Nielsen, Daniel Nilsson, Oliver Geschke, Peixiong Shi, Anders Kristensen

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

    Original languageEnglish
    Title of host publicationConference Digests of the IEEE sponsored Conference on Nanoscale Devices & System Integration (NDSI)
    Number of pages73
    Publication date2004
    Publication statusPublished - 2004

    Cite this