Nano-selective area growth of InGaAs/InP using CBr4 insitu etching

Nadezda Kuznetsova; Elizaveta Semenova; Shima Kadkhodazadeh; Martin Schubert; Kresten Yvind

Nano-selective area growth of InGaAs/InP using CBr4 insitu etching

Nadezda Kuznetsova
, Elizaveta Semenova
, Shima Kadkhodazadeh
, Martin Schubert
, Kresten Yvind

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

We are investigating the conditions for nano-patterned selective area epitaxial growth using e-beam lithography on HSQ resist and in-situ etching in the MOVPE reactor.

Original language	English
Title of host publication	Advanced Photonics Congress
Number of pages	3
Publisher	Optical Society of America
Publication date	2012
Pages	JTu5A.12
Publication status	Published - 2012
Event	Integrated Photonics Research, Silicon and Nanophotonics (IPR) - Colorado Springs, CO, United States Duration: 17 Jun 2012 → 20 Jun 2012 http://www.osa.org/meetings/topical_meetings/ipr/

Conference

Conference	Integrated Photonics Research, Silicon and Nanophotonics (IPR)
Country/Territory	United States
City	Colorado Springs, CO
Period	17/06/2012 → 20/06/2012
Internet address	http://www.osa.org/meetings/topical_meetings/ipr/

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@inproceedings{ca1b21e7a97c4449bf05aa5aac96d2b3,

title = "Nano-selective area growth of InGaAs/InP using CBr4 insitu etching",

abstract = "We are investigating the conditions for nano-patterned selective area epitaxial growth using e-beam lithography on HSQ resist and in-situ etching in the MOVPE reactor.",

author = "Nadezda Kuznetsova and Elizaveta Semenova and Shima Kadkhodazadeh and Martin Schubert and Kresten Yvind",

year = "2012",

language = "English",

pages = "JTu5A.12",

booktitle = "Advanced Photonics Congress",

publisher = "Optical Society of America",

note = "Integrated Photonics Research, Silicon and Nanophotonics (IPR) ; Conference date: 17-06-2012 Through 20-06-2012",

url = "http://www.osa.org/meetings/topical\_meetings/ipr/",

}

TY - GEN

T1 - Nano-selective area growth of InGaAs/InP using CBr4 insitu etching

AU - Kuznetsova, Nadezda

AU - Semenova, Elizaveta

AU - Kadkhodazadeh, Shima

AU - Schubert, Martin

AU - Yvind, Kresten

PY - 2012

Y1 - 2012

N2 - We are investigating the conditions for nano-patterned selective area epitaxial growth using e-beam lithography on HSQ resist and in-situ etching in the MOVPE reactor.

AB - We are investigating the conditions for nano-patterned selective area epitaxial growth using e-beam lithography on HSQ resist and in-situ etching in the MOVPE reactor.

M3 - Article in proceedings

SP - JTu5A.12

BT - Advanced Photonics Congress

PB - Optical Society of America

T2 - Integrated Photonics Research, Silicon and Nanophotonics (IPR)

Y2 - 17 June 2012 through 20 June 2012

ER -

Nano-selective area growth of InGaAs/InP using CBr4 insitu etching

Abstract

Conference

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