Nano-selective area growth of InGaAs/InP using CBr4 insitu etching

Nadezda Kuznetsova, Elizaveta Semenova, Shima Kadkhodazadeh, Martin Schubert, Kresten Yvind

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Abstract

We are investigating the conditions for nano-patterned selective area epitaxial growth using e-beam lithography on HSQ resist and in-situ etching in the MOVPE reactor.
Original languageEnglish
Title of host publicationAdvanced Photonics Congress
Number of pages3
PublisherOptical Society of America
Publication date2012
PagesJTu5A.12
Publication statusPublished - 2012
EventIntegrated Photonics Research, Silicon and Nanophotonics (IPR) - Colorado Springs, CO, United States
Duration: 17 Jun 201220 Jun 2012
http://www.osa.org/meetings/topical_meetings/ipr/

Conference

ConferenceIntegrated Photonics Research, Silicon and Nanophotonics (IPR)
Country/TerritoryUnited States
CityColorado Springs, CO
Period17/06/201220/06/2012
Internet address

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