Morphology evolution of PS-b-PDMS block copolymer and its hierarchical directed self-assembly on block copolymer templates

Sozaraj Rasappa*, Lars Schulte, Dipu Borah, Hanna Hulkkonen, Sokol Ndoni, Turkka Salminen, Ramsankar Senthamaraikanan, Michael A. Morris, Tapio Niemi

*Corresponding author for this work

    Research output: Contribution to journalJournal articleResearchpeer-review

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    Abstract

    Cylinder-forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS, 27.2k-b-11.7k, SD39) block copolymer having a total molecular weight of 39 kg mol−1 was exploited to achieve in-plane morphologies of lines, dots and antidots. Brush-free self-assembly of the SD39 on silicon substrates was investigated using solvents that were PS or PDMS selective, neutral and non-solvents based on their Hansen solubility parameters. The different morphologies were achieved with annealing times ranging from 10 min to 1 h at room temperature. The SD39 patterns were used as an etch mask for transferring the pattern into the underlying substrate. Directed self-assembly and hierarchical directed self-assembly on block copolymer templates for confinement of dots was successfully demonstrated. The strategy for achieving multiple morphologies using one BCP by mere choice of the annealing solvents on unmodified substrates provides a simplified method for surface nanopatterning, templated growth of nanomaterials and nanofabrication.
    Original languageEnglish
    JournalMicroelectronic Engineering
    Volume192
    Pages (from-to)1-7
    ISSN0167-9317
    DOIs
    Publication statusPublished - 2018

    Keywords

    • Block copolymer
    • Hansen solubility
    • Hierarchical self-assembly
    • Selective solvent

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